Nanotechnology

Garant předmětu:

Lecturer:

Tutor:

Supervisor:

Department of Laser Physics and Photonics

Synopsis:

Lectures will introduce students mainly to modern technological methods of preparation of semiconductor, metal and dielectric nanostructures. Physical and chemical fundaments of different technologies (MBE, MOVPE, EBL, sol-gel and colloidal solution) will be explained. Substantive attention will be devoted to epitaxial technologies which are substantial for nanostructure preparation. Particular emphasis will be focused on detail characterization of „in situ“ and „ex situ“ techniques, their applications for heterostructure and nanostructure growths will be discussed as well. Some supportive technical methods - lithography, diffusion, evaporation, ion implantation, contact and dielectric layer preparation will be mentioned as well as soldering and encasement.

Requirements:

Basic course of Quantum Physics, for better understanding also Solid State Physics, eventually Crystallography.

Syllabus of lectures:

1. Preparation of bulk semiconductor monocrystals.

2. Principles of the epitaxial growth of layers and structures for semiconductor nanostructure preparation - Molecular Beam Epitaxy (MBE) and MetalOrganic Vapour Phase Epitaxy (MOVPE).

3. „In situ“ and „Ex situ“ characterisation techniques.

4. Supportive technical methods - lithography, diffusion, evaporation, ion implantation, contact and dielectric layer preparation.

5. Heterostructures, nanostructures, band theory of solid state, quantum constrained structures, quantum wells, superlattices, quantum wires, quantum dots, cascaded system, applications of heterostructures and nanostructures (in semiconductor devices and light sources), active nanostructures.

6. Examples of exploitation and applications of nanostructures and heterostructures for semiconductor devices.

7. Colloidal solutions of nanoparticles, description and definition, examples of applications, physical and chemical effects characteristic for monodispersive colloids, spatial restriction, catalysis.

8. Localized surface plasmons in metallic nanoparticles (LSPR), origination and properties, plasma frequency, LSPR demonstration on gold nanoparticles and nanorods, practical examples.

9. Basic preparation methods of monodispersive colloidal solutions, coalescence - coagulation - nucleation, Turkewich method, electrostatic and spherical stabilization, colloidal solution stabilization, practical examples. Modern methods of nanoparticle preparation. Anisotropic particles of various shapes, nanoparticles selfassembly method.

Syllabus of tutorials:

Study Objective:

Knowledge: basic knowledge of nanotechnologies, its methods and procedures, especially practical, as nanostructure type preparation, main materials used in semiconductor nanotechnologies, and about properties of real nanostructures.

Skills: basic orientation in the field of nanotechnologies, applications and understanding of basic principles, practical demonstration of principles on selected specific structures.

Study materials:

Compulsory literature:

[1] E. L. Wolf, Nanophysics and Nanotechnology, Wiley-VCH, 2004.

[2] G. Gao, Nanostructures and Nanomaterials, Imperial College Press, 2004.

Supplementary literature:

[3] V. A. Schukin, N. N. Ledentsov, D. Bimberg, Epitaxy of Nanostructures, Springer-Verlag, 2004.

[4] M. A. Herman, W. Richter, H. Sitter, Epitaxy, Springer-Verlag, 2004.

[5] K. Iga, S. Kinoshita, Process Technology for Semiconductor Lasers, Springer-Verlag, 1996.

[6] V. M. Ustinov, A. E. Zhukov, A. Y. Egorov, N. A. Maleev, Quantum dot lasers, Oxford University Press, 2003.

[7] T. Numai, Fundamentals of Semiconductor lasers, Springer-Verlag, 2004.

[8] D. Sands, Diode lasers, Institute of Physics Publishing, Series in Optics and Optoelectronics, 2005.

[9] M. Grundmann, Nano-optoelectronics, Springer-Verlag, 2002.

[10] G. A. Ozin, A. C. Arsenault, L. Cademartiri, Nanochemistry, RSC 2008.

Note:

Further information:

No time-table has been prepared for this course

The course is a part of the following study plans:

• BS Matematické inženýrství - Matematické modelování (elective course)
• BS Matematické inženýrství - Matematická fyzika (elective course)
• BS Matematické inženýrství - Aplikované matematicko-stochastické metody (elective course)
• BS Informatická fyzika (elective course)
• BS Aplikace softwarového inženýrství (elective course)
• BS Aplikovaná informatika (elective course)
• BS jaderné inženýrství B (elective course)
• BS Jaderné inženýrství C (elective course)
• BS Dozimetrie a aplikace ionizujícího záření (elective course)
• BS Experimentální jaderná a částicová fyzika (elective course)
• BS Inženýrství pevných látek (elective course)
• BS Diagnostika materiálů (elective course)
• BS Fyzika a technika termojaderné fúze (elective course)
• BS Fyzikální elektronika (compulsory course of the specialization, elective course)
• BS Jaderná chemie (elective course)
• Fyzikální inženýrství - Počítačová fyzika (elective course)
• Fyzikální inženýrství - Fyzikální inženýrství materiálů (elective course)
• Fyzikální inženýrství - Inženýrství pevných látek (elective course)
• Fyzikální inženýrství - Laserová technika a fotonika (elective course)
• Physical Engineering - Computational physics (elective course)