Thin film diagnostics

Garant předmětu:

Lecturer:

Tutor:

Supervisor:

Department of Control Engineering

Synopsis:

Surface characterization. Definition of a thin film. Deposition methods; chemical vapor deposition, physical vapor deposition. Thin film characterization: optical methods; electron diffraction. Ion implantation. X-ray diffraction and photoelectron spectroscopy. Thickness, mechanical, optical and electrical properties.

Requirements:

Syllabus of lectures:

1. Ideal and real surface, surface roughness, surface characterization

2. Definition of thin film, Chemical Vapor Deposition

3. Physical Vapor Deposition, Growth of thin films

4. Optical Methods, AFM

5. Electron Diffraction, LEED and RHEED methods

6. Scanning Electron Microscopy (SEM), Energy-Dispersive X-ray Spectroscopy

7. Auger Electron Spectroscopy (AES), Transmission Electron Microscopy (TEM)

8. Ion implantation, Secondary Ion Mass Spectroscopy (SIMS)

9. Rutherford Backscattering Spectroscopy (RBS), Elastic Recoil Detection Analysis (ERDA)

10. X-ray Diffraction, X-ray Photoelectron spectroscopy

11. Thickness measurements

12. Mechanical properties

13. Optical and electrical properties

Syllabus of tutorials:

PhD students will visit research laboratories and carry out simple measurements on selected samples (AFM, SEM/EDX, XRD, Raman, etc).

Study Objective:

The main goal is to provide an overview of analytical methods focused mainly on thin films deposited by chemical and physical vapor deposition.

Study materials:

1. Surface Analysis: The Principal Techniques, John C. Vickerman, Ian Gilmore (Editors), Wiley, 2nd edition, 2009, ISBN 0470017643

2. Surface Analysis Methods in Materials Science, D.J. O'Connor, Brett A. Sexton, Roger S.C. Smart (Editors) , Springer, 2nd edition, 2010, ISBN 3642074588

Note:

Further information:

No time-table has been prepared for this course

The course is a part of the following study plans: