Advanced Technology for Implants and Biosensors

Course guarantor:

Lecturer:

Tutor:

Supervisor:

Department of Natural Sciences

Synopsis:

1) PVD and CVD deposition technologies, criteria for selection of technology. Main PVD and CVD thin film technologies, principles, advantages, disadvantages of PVD and CVD methods (growth rate, particulate energy, pressure, limitations, deposited area). 2) Evaporation and sputtering techniques (diode sputtering, magnetron,, principles, limitations). Deposition methods as IBAD, ion plating. Deposition methods as MBE, ECR, LPE, sol-gel, CVD). 4) Lasers and their application in material research, dependencies of energy with irradiation time, 5) Pulsed laser deposition, advantages, disadvantages. Focuzation of laser beam 6) Interaction of laser beam with target 7) Plasma plume 8) characterization of layers properties, ovewiev of methods used. XRD, FTIR, Raman spectroscopy, NMR 9) Layer analysis- morphology- SEM, AFM, STM, SNOM, TEM. Analysis of layers composition- XPS, ESCA, AES 10) Analysis of layers ? WDS, PIXE, RBS, SIMS 11) Optical methods for films characterisation- ellipsometry, transmission, refraction index) 12) Film growth mechanismus (Frank der Merve, Volmer Veber, Stranski Krastanov), homoepitaxy, heteroepitaxy. 13) Hybrid laser deposition systems (RF discharges, magnetron, double PLD) . MAPLE, organic layers 14) Medical applications of thin films (hydroxyapatite, diamond- like layrs m dopation). Biocompatible materials.

Requirements:

Teaching is performed in the form of the controlled self-study with regular consultations. Except for the examination the student is required to write an extra study on a given topic.

Syllabus of lectures:

1) PVD and CVD deposition technologies, criteria for selection of technology. Main PVD and CVD thin film technologies, principles, advantages, disadvantages of PVD and CVD methods (growth rate, particulate energy, pressure, limitations, deposited area). 2) Evaporation and sputtering techniques (diode sputtering, magnetron,, principles, limitations). Deposition methods as IBAD, ion plating. Deposition methods as MBE, ECR, LPE, sol-gel, CVD). 4) Lasers and their application in material research, dependencies of energy with irradiation time, 5) Pulsed laser deposition, advantages, disadvantages. Focuzation of laser beam 6) Interaction of laser beam with target 7) Plasma plume 8) characterization of layers properties, ovewiev of methods used. XRD, FTIR, Raman spectroscopy, NMR 9) Layer analysis- morphology- SEM, AFM, STM, SNOM, TEM. Analysis of layers composition- XPS, ESCA, AES 10) Analysis of layers ? WDS, PIXE, RBS, SIMS 11) Optical methods for films characterisation- ellipsometry, transmission, refraction index) 12) Film growth mechanismus (Frank der Merve, Volmer Veber, Stranski Krastanov), homoepitaxy, heteroepitaxy. 13) Hybrid laser deposition systems (RF discharges, magnetron, double PLD) . MAPLE, organic layers 14) Medical applications of thin films (hydroxyapatite, diamond- like layrs m dopation). Biocompatible materials.

Syllabus of tutorials:

Study Objective:

Study materials:

D.B. Chrisey, G.K. Hubler: Pulsed laser Deposition of Thin Films, John Wiley, 1994

B.E.A. Saleh, M.C. Teich: Základy fotoniky, svazek 3, matfyzpress, Praha 1995

M. Vrbová a kol.: Lasery a moderní optika: oborová encyklopedie, Prometheus, Praha, 1994

M. Jelínek: Pulsní laserová depozice tenkých vrstev v elektronice, doktorská disertační práce, Praha 1999

M. Jelínek: Laserová depozice tenkých vrstev, Habilitační práce, Praha 2005

M. Gricová: Metoda analýzy materiálu, skripta ČVUT FEL, 1992

J.C.Miller, R.F.Haglund: Laser deposition and desorption. Vol. 30, Experimental methods in the physical sciences, Academic Press, 1998

Handbook of deposition technologies for films and coatings, second edition, Noyes publication,

R.F. Bunshah - editor, 1994

Note:

Further information:

Course may be repeated

No time-table has been prepared for this course

The course is a part of the following study plans: