Experimental Methods in Plasma Physics

The course is not on the list Without time-table
Code Completion Credits Range
W02O001 ZK 4P+1C
Garant předmětu:
Department of Physics

This subject informs about the basic problems of plasma physics especially in term of the use of plasma assisted methods in machinery. Discharges in gas as the sources of low temperature plasma. Characterization of particular types of discharges. Basic plasma parameters, Boltzmann´s transportation equation, ambipolar diffusion. Plasma diagnostics, mass spectrometry of gases. Probe methods, measurements and evaluation. Optical diagnostics, emission and absorption spectrometry. Application of plasma methods in the branch of coatings deposition and surface modifications.


Understanding physics on the level of basic course.

Syllabus of lectures:

1.Applications of plasma assisted methods in technology.

2.Basic properties of plasma, parameters and plasma description.

3.Gas discharges as plasma sources in technology.

4.Boltmann kinetic equation, ambipolar diffusion.

5.Plasma diagnostics, mass spectrometry.

6.Probe methods, evaluation of measurements.

7.Optical emission of plasma, emission and absorption spectroscopy.

8.Plasma interaction with surfaces of solids.

9.Plasma nitridation technology.

10.Plasma assisted magnetron deposition.

11.Plasma assisted methods of coating deposition.

12.Plasma assisted welding and material cutting.

Syllabus of tutorials:

1.Basics of vacuum facilities servicing.

2.Measurements of glow discharge parameters.

3.Mass spectrometer servicing.

4.Measurement and evaluation of optical emission of plasma.

5.Magnmetron sputtering of hard coatings.

6.Coating deposition by evaporation and ion plating.

Study Objective:

To make PhD. students acquainted with basic knowledge of low temperature plasma physics. The level of knowledge should be sufficient for understanding of processes during plasma assisted technologies (surface modification, coatings deposition, material cutting etc.) and parameters matching to fulfill the particular tasks.

Study materials:

Pouch,J.J.;Alterovitz S.A;: Plasma properties, deposition and etching, Trans Tech Publications,Switzerland,1993.

Kiyotaka,W; Shigeru,H.;: Handbook of Sputter Deposition Technology, Noyes Publications, USA,1991.

Further information:
No time-table has been prepared for this course
The course is a part of the following study plans:
Data valid to 2024-06-16
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