Introduction to Surface and Thin Film Physics

Lecturer:

Tutor:

Supervisor:

Department of Control Engineering

Synopsis:

The subject is aimed on physics of thin films and surfaces of solids consisting of three parts: i) summary of deposition methods for thin films, ii) description of analytical methods for surface and film analysis, and iii) application of selected analytical and deposition methods. The exercise is focused on practical use of several methods available at CTU in Prague (evaporation, magnetron sputtering, SEM, AFM, etc.)

Requirements:

Syllabus of lectures:

1.Surface and thin films characterization, ideal and real surfaces

2.Physical Vapour Deposition methods for thin film deposition

3.Chemical Vapour Deposition

4.Growth mechanisms of thin films

5.The properties of thin films and metal surfaces

6.Interaction of electrons with surface I: diffraction, LEED and RHEED

7.Interaction of electrons with surface II: Scanning electron microscopy

8.Interaction of electrons with surface III: Auger electron spectroscopy

9.Interaction of ions with surface I: ion implantation, SIMS

10.Interaction of ions with surface II: RBS and ERDA

11.Interaction of radiation with surface: XPS and XRD

12.Scanning tunneling microscopy

13.Atomic force measurement

14.Advanced methods of optical microscopy

Syllabus of tutorials:

Study Objective:

Study materials:

Walls J.M., Smith R. : Surface Science Techniques, Pergamon, 1994

Note:

Further information:

No time-table has been prepared for this course

The course is a part of the following study plans: